Breakdown field | ≈4·105 V/cm |
Mobility electrons | ≤8500 cm2 V-1s-1 |
Mobility holes | ≤400 cm2 V-1s-1 |
Diffusion coefficient electrons | ≤200 cm2/s |
Diffusion coefficient holes | ≤10 cm2/s |
Electron thermal velocity | 4.4·105 m/s |
Hole thermal velocity | 1.8·105m/s |
Electron Hall mobility versus temperature for different doping levels. (Stillman et al. [1970] 1. Bottom curve: Nd=5·1015cm-3; 2. Middle curve : Nd=1015cm-3; 3. Top curve : Nd=5·1015cm-3 For weakly doped GaAs at temperature close to 300 K, electron Hall mobility µH=9400(300/T) cm2 V-1 s-1 |
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Electron Hall mobility versus temperature for different doping levels and degrees of compensation (high temperatures): Open circles: Nd=4Na=1.2·1017 cm-3; Open squares: Nd=4Na=1016 cm-3; Open triangles: Nd=3Na=2·1015 cm-3; Solid curve represents the calculation for pure GaAs (Blakemore[1982]). For weakly doped GaAs at temperature close to 300 K, electron drift mobility µn=8000(300/T)2/3 cm2 V-1 s-1 |
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Drift and Hall mobility versus electron concentration for different degrees of compensation T= 77 K (Rode [1975]). |
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Drift and Hall mobility versus electron concentration for different degrees of compensation T= 300 K (Rode [1975]). |
Temperature dependence of the Hall factor for pure n-type GaAs in a weak magnetic field (Rode [1975]). |
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Temperature dependence of the Hall mobility for three high-purity samples (Wiley [1975]) |
The hole Hall mobility versus hole density. (Wiley [1975]) |
Field dependences of the electron drift velocity. (Blakemore[1982]). Solid curve was calculated by (Pozhela and Reklaitis[1980]). Dashed and dotted curves are measured data, 300 K |
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Field dependences of the electron drift velocity for high electric fields, 300 K. (Blakemore[1982]). |
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Field dependences of the electron drift velocity at different temperatures. (Pozhela and Reklaitis[1980]). |
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Fraction of electrons in L and X valleys. nL and nX as a function of electric field F at 77, 160, and 300 K, Nd=0 (Pozhela and Reklaitis[1980]). Dotted curve - L valleys, dashed curve - X valleys. |
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Mean energy E in Γ, L, and X valleys as a function of electric field F at 77, 160, and 300 K, Nd=0 (Pozhela and Reklaitis[1980]). Solid curve - Γ valleys, dotted curve - L valleys, dashed curve - X valleys. |
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Frequency dependences of electron differential mobility. µd is real part of the differential mobility; µd*is imaginary part of differential mobility. F= 5.5 kV cm-1 (Rees[1969]). |
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The field dependence of longitudinal electron diffusion coefficient D||F. Solid curves 1 and 2 are theoretical calculations. Dashed curves 3, 4, and 5 are experimental data. Curve 1 - from (Pozhela and Reklaitis[1980]). Curve 2 - from (Fauquembergue et al.[1980]). Curve 3 - from (Ruch and Kino[1968]). Curve 4 - from (Bareikis et al.[1978]). Curve 5 - (from de Murcia[1991]). |
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Field dependences of the hole drift velocity at different temperatures. (Datal et al. [1971]). |
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Temperature dependence of the saturation hole velocity in high electric fields (Datal et al. [1971]). |
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The field dependence of the hole diffusion coefficient. (Joshi and Crendin [1989]). |
There are two schools of thought regarding the impact ionization in GaAs.
The first one states that impact ionization rates αi and βi for electrons and holes in GaAs are known accurately enough to distinguish such subtle details such as the anisothropy of αi and βi for different crystallographic directions. This approach is described in detail in the work by Dmitriev et al.[1987].
Experimental curves αi and βi versus 1/F for GaAs. (Pearsall et al. [1978]). |
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Experimental curves αi and βi versus 1/F for GaAs. (Pearsall et al. [1978]). |
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Experimental curves αi and βi versus 1/F for GaAs. (Pearsall et al. [1978]). |
Breakdown voltage and breakdown field versus doping density for an abrupt p-n junction. (Kyuregyan and Yurkov [1989]). |
Pure n-type material (no ~ 1014cm-3) | |
The longest lifetime of holes | τp ~3·10-6 s |
Diffusion length Lp = (Dp·τp)1/2 | Lp ~30-50 µm. |
Pure p-type material | |
(a)Low injection level | |
The longest lifetime of electrons | τn ~ 5·10-9 s |
Diffusion length Ln = (Dn·τ n)1/2 | Ln ~10 µm |
(b) High injection level (filled traps) | |
The longest lifetime of electrons | τ ~2.5·10-7 s |
Diffusion length Ln | Ln ~ 70 µm |
Surface recombination velocity versus doping density (Aspnes [1983]). Different experimental points correspond to different surface treatment methods. |
90 K | 1.8·10-8cm3/s |
185 K | 1.9·10-9cm3/s |
300 K | 7.2·10-10cm3/s |
300 K | ~10-30cm6/s |
500 K | ~10-29cm6/s |