Electric microfield distributions in electron-ion plasmas

A. Y. Potekhin,
Physico-Technical Institute, St Petersburg, Russia
G. Chabrier,
Ecole Normale Superieure de Lyon, France
D. Gilles
Commissariat a l'Energie Atomique, Centre d'Etudes de Limeil-Valenton, France

Low-frequency electric microfield distribution in a Coulomb plasma is calculated for various plasma parameters, from weak to strong coupling and from zero to strong electron screening. Two methods of numerical calculations - the adjustable-parameter exponential approximation and the Monte Carlo simulation - are employed and compared with each other. The results are reproduced by analytic fitting formulae suitable for applications.


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