Speakers |
Wanda Andreoni, IBM Zurich Research Laboratory, Switzerland | | Alexander
Bagatur'yants, Photochemistry Center, Russian Academy of Sciences, Moscow, Russia |
| Gennadi Bersuker, SEMATECH, Austin, USA |
| Douglas Buchanan, University of Manitoba, Winnipeg, Canada | |
Gianfranco Cerofolini, ST Microelectronics, Catania, Italy |
| Tze-Chiang Chen, IBM T.J. Watson Research Center, Yorktown Heights, NY |
| Alessandro Curioni, IBM Zurich Research Laboratory, Switzerland |
| Alex Demkov, University of Texas, Austin, USA | | Art H. Edwards,
US Air Force Research Lab/Space Vehicle Division, Albuquerque, USA |
| Athanasios Dimoulas, Institute of Materials Science, NCSR "Demokritos",
Athens, Greece | | Vladimir Emel'yanov, Sci, Instrum. Research Institute,
Moscow, Russia | | Marco Fanciulli, National Institute
for the Physics of Matter (INFM), Milan, Italy | | Vincenzo Fiorentini,
University of Cagliari, Monserrato, Italy | |
Karol Frohlich, Slovak Academy of Science, Bratislava, Slovak Republic |
| Eric Garfunkel, Rutgers University, Piscataway, USA |
| Jacob Gavarin, University College London, UK |
| David Gilmer, Freescale Semiconductors, Austin, USA | |
Jim Greer, Tyndall National Institute, Cork, Ireland | | Vladimir
Gritsenko, Institute of Semiconductor Physics, Novosibirsk, Russia |
| Supratik Guha, IBM T.J. Watson Research Center, Yorktown Heights,
USA | | Evgeni Gusev, IBM
T.J. Watson Research Center, Yorktown Heights, USA |
| Torgny Gustafsson, Rutgers University, Piscataway, USA | | Johan
Klootwijk, Philips Research Laboratories, Eindhoven, The Netherlands |
| Andrey Knizhnik, Kintech, Moscow, Russian | | Kaupo Kukli,
University of Tartu, Estonia and University of Helsinki, Finland |
| Byoung Lee, SEMATECH/IBM, Austin, USA | | T.P. Ma, Yale University,
New Haven, USA | | Prashant Majhi, International
SEMATECH/INTEL, Austin Texas | | Paul McIntyre, Stanford University,
USA | | Montserrat Nafria, University Autonoma
Barcelona, Spain | | Masaaki Niwa, IMEC Team at Semiconductor Company
of Matsushita Electric Industrial Co., Ltd., Lueven, Belgium |
| Vladimir Osipov, Ioffe Institute, St Petersburg,
Russia | Joerg Osten, Institute for Semiconductor Devices and Electronic
Materials, University of Hannover, Germany | | Sokrates
Pantelides, Vanderbilt University, Nashville, USA |
| Albena Paskaleva, Bulgarian Academy of Sciences, Sofia | | Luigi
Pantisano, IMEC, Leuven, Belgium | | Alfredo Pasquarello,
EPFL-SB-ITP-CSEA, Lausanne, Switzerland | | Ioana Pintilie, National
Institute for Materials Physics, Bucharest, Romania |
| Gilles Reimbold, LETI-CEA, Grenoble, France | | John Robertson,
University of Cambridge, UK | | Andre Stesmans,
Katholieke University Lueven, Belgium | | Wilman Tsai, INTEL, Santa
Clara, USA | | Eric Vogel, NIST, Gaithersburg, USA |
| Jurgen Von Bardeleben, University of Paris, France |
| Robert Wallace, University of Texas, Dallas, USA | | Andrei
Zenkevich, Moscow Engineering Physics Institute, Russia |
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