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Aixtron 2000HT

Epiquip VP 50RP

Epitaxial Equipment


AIXTRON AIX 2000/HT

First in Russia system AIX 2000/HT for MOCVD growth III-N compound semiconductors. (RUS page)

AIX 2000/HT Planetary Reactor® with Gas Foil Rotation®

Wafer capacity  6 x 2''

Applications   III-Nitrides

Average throughput   up to 27.000 wafers per year


AIX 2000/HT AIX 2000/HT AIX 2000/HT AIX 2000/HT
AIX 2000/HT AIX 2000/HT AIX 2000/HT AIX 2000/HT AIX 2000/HT



Epiquip VP 50-RP

reactor design

  • Horizontal flow quartz reactor
  • Inductively heated graphite susceptor
  • Tmax > 11000C
  • Pcell = 200-600 mbar

Growth conditions:

  • Precursors - NH3, TMG (two source), TMA, TMI, Cp2Mg, SiH4, AsH3
  • Carrier gas - Ar for InGaN growth and H2 for all other growth steps

In-situ optical reflectance monitoring in the near-normal incident using He-Ne laser and Si photodetector.

The growth process are operated by full automatic system.

EpiQuip reactor with ORM system EpiQuip EpiQuip reactor top EpiQuip control center OR and GaN layer growth sequence

 

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