Epiquip VP 50-RP

- Horizontal flow quartz reactor
- Inductively heated graphite susceptor
- Tmax > 11000C
- Pcell = 200-600 mbar
Growth conditions:
- Precursors - NH3, TMG (two source), TMA, TMI, Cp2Mg, SiH4, AsH3
- Carrier gas - Ar for InGaN growth and H2 for all other growth steps
In-situ optical reflectance monitoring in the near-normal incident using He-Ne laser and Si photodetector.
The growth process are operated by full automatic system.
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