Ioffe Physico-Technical InstituteLaboratory of Physics of Semiconductor Heterostructure  
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Design UV structure

OP Lasing UV structure

Design InGaN/GaN structure

AlGaN optimization

Optical Pumping

Theoretical calculations

Blue-green OP lasing

Lasing in UV optical range

Theoretical modeling of the high-order modes

OP lasing via high-order modes

LD Technology

AlGaN optimization for growth of
cladding layers



Up to 25% (40%) AlN mole fraction was realized in
AlGaN epilayers under the optimized growth conditions at
400 mbar (200 mbar) reactor pressure for AIX2000HT system

 

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